Annals of Occupational and Environmental Medicine

Yang In Hwang

1 Article

Assessment of Arsenic Exposure by Measurement of Urinary Speciated Inorganic Arsenic Metabolites in Workers in a Semiconductor Manufacturing Plant: Kiwhan Byun, Yong Lim Won, Yang In Hwang, Dong-Hee Koh, Hosub Im, Eun-A Kim; Ann Occup Environ Med 2013;25:21-21. Published online October 11, 2013; DOI: https://doi.org/10.1186/2052-4374-25-21

Objectives

The purpose of this study was to evaluate the exposure to arsenic in preventive maintenance (PM) engineers in a semiconductor industry by detecting speciated inorganic arsenic metabolites in the urine.

Methods

The exposed group included 8 PM engineers from the clean process area and 13 PM engineers from the ion implantation process area; the non-exposed group consisted of 14 office workers from another company who were not occupationally exposed to arsenic. A spot urine specimen was collected from each participant for the detection and measurement of speciated inorganic arsenic metabolites. Metabolites were separated by high performance liquid chromatography-inductively coupled plasma spectrometry-mass spectrometry.

Results

Urinary arsenic metabolite concentrations were 1.73 g/L, 0.76 g/L, 3.45 g/L, 43.65 g/L, and 51.32 g/L for trivalent arsenic (As³⁺), pentavalent arsenic (As⁵⁺), monomethylarsonic acid (MMA), dimethylarsinic acid (DMA), and total inorganic arsenic metabolites (As³⁺ + As⁵⁺ + MMA + DMA), respectively, in clean process PM engineers. In ion implantation process PM engineers, the concentrations were 1.74 g/L, 0.39 g/L, 3.08 g/L, 23.17 g/L, 28.92 g/L for As³⁺, As⁵⁺, MMA, DMA, and total inorganic arsenic metabolites, respectively. Levels of urinary As³⁺, As⁵⁺, MMA, and total inorganic arsenic metabolites in clean process PM engineers were significantly higher than that in the non-exposed group. Urinary As³⁺ and As⁵⁺ levels in ion implantation process PM engineers were significantly higher than that in non-exposed group.

Conclusion

Levels of urinary arsenic metabolites in PM engineers from the clean process and ion implantation process areas were higher than that in office workers. For a complete assessment of arsenic exposure in the semiconductor industry, further studies are needed.

Citations

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